OPC cycle time reduction and accuracy improvement by early access to advanced Tachyon modeling of TWINSCAN XT:1900i scanner

Peter Nikolsky; Tjitte Nooitgedagt; Paul van Adrichem; Jeroen Meessen; Carsten Kohler; Baukje Wisse; Stefan Hunsche

doi:10.1117/12.802204

17 October 2008 OPC cycle time reduction and accuracy improvement by early access to advanced Tachyon modeling of TWINSCAN XT:1900i scanner

Peter Nikolsky, Tjitte Nooitgedagt, Paul van Adrichem, Jeroen Meessen, Carsten Kohler, Baukje Wisse, Stefan Hunsche

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 712249 (2008) https://doi.org/10.1117/12.802204
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

Double Patterning (DP), Spacers and other advanced Litho technologies require an enormous amount of CD and tool data collection and development time for Optical Proximity Correction (OPC) modeling. Unfortunately this process could be started typically only when the Litho and Etch process development for the OPC'ed layer is done. This leads to significant (a month and more) delays with the mask tape-outs and final chip readiness for production. In this paper we discussed a way to reduce the overall OPC and MDP preparation and product-to-market time and increase the OPC accuracy by early collection of the OPC measurements, automatic CD-SEM recipe generation and CD data analysis and model calibration with Tachyon software. We reviewed the design of the OPC test chip, OPC exposures, data analysis and OPC modeling on the advanced and accurate Tachyon T2.0 OPC platform and ways to improve modeling cycle time. Another critical parameter of the OPC modeling is accuracy as one of the main parts of the CD error budget. We investigated approaches to OPC modeling accuracy and achieved RMS below 1nm for critical features by using module data of the respective ASML TWINSCAN XT:1900i scanner and advanced Tachyon software.

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Peter Nikolsky, Tjitte Nooitgedagt, Paul van Adrichem, Jeroen Meessen, Carsten Kohler, Baukje Wisse, and Stefan Hunsche "OPC cycle time reduction and accuracy improvement by early access to advanced Tachyon modeling of TWINSCAN XT:1900i scanner", Proc. SPIE 7122, Photomask Technology 2008, 712249 (17 October 2008); https://doi.org/10.1117/12.802204

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