Development of photosensitive silsesquioxane

Yuji Tashiro; Takeshi Sekito; Takafumi Iwata; Daishi Yokoyama; Toshiaki Nonaka

doi:10.1117/12.804669

4 December 2008 Development of photosensitive silsesquioxane

Yuji Tashiro, Takeshi Sekito, Takafumi Iwata, Daishi Yokoyama, Toshiaki Nonaka

Proceedings Volume 7140, Lithography Asia 2008; 71402O (2008) https://doi.org/10.1117/12.804669
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively. Here we present feature of photolithography process and film properties for our SOG materials.

Citation Download Citation

Yuji Tashiro, Takeshi Sekito, Takafumi Iwata, Daishi Yokoyama, and Toshiaki Nonaka "Development of photosensitive silsesquioxane", Proc. SPIE 7140, Lithography Asia 2008, 71402O (4 December 2008); https://doi.org/10.1117/12.804669

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