OFI rare-gas excimer amplifier for high-intensity VUV pulse generation

Masahito Katto; Masanori Kaku; Kazuyoshi Oda; Tadashi Kamikihara; Atsushi Yokotani; Shoichi Kubodera; Noriaki Miyanaga; Kunioki Mima

doi:10.1117/12.807339

19 February 2009 OFI rare-gas excimer amplifier for high-intensity VUV pulse generation

Masahito Katto, Masanori Kaku, Kazuyoshi Oda, Tadashi Kamikihara, Atsushi Yokotani, Shoichi Kubodera, Noriaki Miyanaga, Kunioki Mima

Author Affiliations +

Proceedings Volume 7196, High Energy/Average Power Lasers and Intense Beam Applications III; 71960L (2009) https://doi.org/10.1117/12.807339
Event: SPIE LASE: Lasers and Applications in Science and Engineering, 2009, San Jose, California, United States

Abstract

We have demonstrated an argon excimer vacuum ultraviolet (VUV) amplifier at 126 nm by using the optical-field induced ionization (OFI) of argon. The gain-length product of 5.6 was achieved as a result of the optical feedback inside the amplifier with a VUV mirror. Plasma self-channeling caused by the high-intensity pump laser was simultaneously observed when the maximum gain-length product was observed. We have also optimized the output power of a subpicosecond VUV seed beam at 126 nm produced in low-pressure rare-gases as a result of the seventh harmonic nonlinear wavelength conversion of a Ti:Sapphire laser at 882 nm.

Citation Download Citation

Masahito Katto, Masanori Kaku, Kazuyoshi Oda, Tadashi Kamikihara, Atsushi Yokotani, Shoichi Kubodera, Noriaki Miyanaga, and Kunioki Mima "OFI rare-gas excimer amplifier for high-intensity VUV pulse generation", Proc. SPIE 7196, High Energy/Average Power Lasers and Intense Beam Applications III, 71960L (19 February 2009); https://doi.org/10.1117/12.807339

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