Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

S. Matsunari; Y. Kakutani; T. Aoki; S. Kawata; K. Murakami

doi:10.1117/12.813640

18 March 2009 Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

S. Matsunari, Y. Kakutani, T. Aoki, S. Kawata, K. Murakami

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713R (2009) https://doi.org/10.1117/12.813640
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Si/Mo multi-layer mirrors are oxidized by a photochemical reaction with water gas and extreme ultraviolet (EUV) light. They do not have enough durability in EUV lithography tools. 14 types of capped mirror samples (SiO₂, TiO₂, V₂O₅, Cr₂O₃, Mn₂O₃, Y₂O₃, Nb₂O₅, RuO₂, Rh₂O₃, PdO, SnO₂, La₂O₃, CeO₂, WO₃-capped) have been investigated on the anti-oxidation property under the 150-1600J/mm² EUV irradiation at SR facilities. We have irradiated samples under the 1x10^-4Pa and 9x10^-4Pa water vapors. TiO₂, V₂O₅, Cr₂O₃, Nb₂O₅, CeO₂-capped mirror samples suppress reflectance drops and Si layers oxidation. These metal ions have similar radii. We have measured local structure of the RuO₂ layer with lower durability. The RuO2 layer is amorphous. This Amorphous RuO₂ layer loses the long range order of bonds and the short range order of the first shell. The Ru-O bonds remains with losing coordination number. To accelerate durability tests for a high volume machine, we have constructed a new dedicated beam line at the SAGA Light Source.

Citation Download Citation

S. Matsunari, Y. Kakutani, T. Aoki, S. Kawata, and K. Murakami "Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713R (18 March 2009); https://doi.org/10.1117/12.813640

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