Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics

Juequan Chen; Eric Louis; Fred Bijkerk; Chris J. Lee; Herbert Wormeester; Reinhard Kunze; Hagen Schmidt; Dieter Schneider; Roel Moors; Willem van Schaik; Monika Lubomska

doi:10.1117/12.824435

18 March 2009 Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics

Juequan Chen, Eric Louis, Fred Bijkerk, Chris J. Lee, Herbert Wormeester, Reinhard Kunze, Hagen Schmidt, Dieter Schneider, Roel Moors, Willem van Schaik, Monika Lubomska

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 727140 (2009) https://doi.org/10.1117/12.824435
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm.

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Juequan Chen, Eric Louis, Fred Bijkerk, Chris J. Lee, Herbert Wormeester, Reinhard Kunze, Hagen Schmidt, Dieter Schneider, Roel Moors, Willem van Schaik, and Monika Lubomska "Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics", Proc. SPIE 7271, Alternative Lithographic Technologies, 727140 (18 March 2009); https://doi.org/10.1117/12.824435

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