Organized DFM

Takashi Sato; Michio Honma; Hiroyuki Itoh; Nobuyuki Iriki; Sachiko Kobayashi; Norihiko Miyazaki; Toshio Onodera; Hiroyuki Suzuki; Nobuyuki Yoshioka; Sumika Arima; Kazuya Kadota

doi:10.1117/12.824354

11 May 2009 Organized DFM

Takashi Sato, Michio Honma, Hiroyuki Itoh, Nobuyuki Iriki, Sachiko Kobayashi, Norihiko Miyazaki, Toshio Onodera, Hiroyuki Suzuki, Nobuyuki Yoshioka, Sumika Arima, Kazuya Kadota

Author Affiliations +

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737934 (2009) https://doi.org/10.1117/12.824354
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

The category and objective of DFM production management are shown. DFM is not limited to an activity within a particular unit process in design and process. A new framework for DFM is required. DFM should be a total solution for the common problems of all processes. Each of them must be linked to one another organically. After passing through the whole of each process on the manufacturing platform, quality of final products is guaranteed and products are shipped to the market. The information platform is layered with DFM, APC, and AEC. Advanced DFM is not DFM for partial optimization of the lithography process and the design, etc. and it should be Organized DFM. They are managed with high-level organizational IQ. The interim quality between each step of the flow should be visualized. DFM will be quality engineering if it is Organized DFM and common metrics of the quality are provided. DFM becomes quality engineering through effective implementation of common industrial metrics and standardized technology. DFM is differential technology, but can leverage standards for efficient development.

Citation Download Citation

Takashi Sato, Michio Honma, Hiroyuki Itoh, Nobuyuki Iriki, Sachiko Kobayashi, Norihiko Miyazaki, Toshio Onodera, Hiroyuki Suzuki, Nobuyuki Yoshioka, Sumika Arima, and Kazuya Kadota "Organized DFM", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737934 (11 May 2009); https://doi.org/10.1117/12.824354

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KEYWORDS

Design for manufacturing

Manufacturing

Standards development

Process modeling

Information technology

Photomasks

Semiconductors

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