Paper
17 June 2009 Interferometric characterization of mono- and polycrystalline CVD diamond
Maurizio Vannoni, Giuseppe Molesini, Silvio Sciortino, Stefano Lagomarsino, Paolo Olivero
Author Affiliations +
Abstract
Mono and polycrystalline Chemical Vapor Deposited (CVD) diamond is a promising material for several advanced topics: microchips substrate, biological applications, UV and particle detection. Commercial CVD diamonds are available in small square size, commonly 3-5 millimeters side and 0.5-1.5 millimeters thickness. To improve diamond reliability for described applications, it is important to have a quality control on diamond samples, not only for electrical constants but also for optical characteristics and surface roughness. In this paper we present an optical characterization method based on interferometric instruments, to measure surface structure and internal homogeneity of mono ad polycrystalline commercial CVD diamonds, with measurement examples.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Maurizio Vannoni, Giuseppe Molesini, Silvio Sciortino, Stefano Lagomarsino, and Paolo Olivero "Interferometric characterization of mono- and polycrystalline CVD diamond", Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 738931 (17 June 2009); https://doi.org/10.1117/12.827535
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Diamond

Chemical vapor deposition

Interferometry

Refractive index

Microscopes

Gases

Particles

RELATED CONTENT


Back to Top