Influence of partially coherent illumination on aerial-image-based aberration measurement of projection optics in lithographic tools

Tingting Zhou; Shiyuan Liu; Wei Liu; Lijuan Wang

doi:10.1117/12.837770

20 November 2009 Influence of partially coherent illumination on aerial-image-based aberration measurement of projection optics in lithographic tools

Tingting Zhou, Shiyuan Liu, Wei Liu, Lijuan Wang

Author Affiliations +

Proceedings Volume 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems; 751104 (2009) https://doi.org/10.1117/12.837770
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

In this paper, the aberration measurement technique using aerial image sensor (AIS) is further derived, and the influence of partially coherent illumination on the performance of this technique is analyzed comprehensively in practice. The AIS based technique detects the intensity of the aerial image to obtain the wavefront aberration on each sampling point of the exit pupil using a set of 36 binary gratings with different pitches and orientations. The simulation work conducted by the lithographic simulator PROLITH has demonstrated that the aberration measurement errors grow with the partial coherent factor increasing. Two effects of the partially coherent illumination are proposed to interpret such influence that causes the measurement errors.

Citation Download Citation

Tingting Zhou, Shiyuan Liu, Wei Liu, and Lijuan Wang "Influence of partially coherent illumination on aerial-image-based aberration measurement of projection optics in lithographic tools", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 751104 (20 November 2009); https://doi.org/10.1117/12.837770

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