Relaxation properties of dielectric dipoles of photo resist materials

Hiroki Sasazaki; Akira Kawai

doi:10.1117/12.841126

14 December 2009 Relaxation properties of dielectric dipoles of photo resist materials

Hiroki Sasazaki, Akira Kawai

Proceedings Volume 7520, Lithography Asia 2009; 75202X (2009) https://doi.org/10.1117/12.841126
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

Relaxation properties of dielectric dipoles such as dielectric frequency dispersion, relaxation time, which should be optimized in structural material designing, are characterized. Relaxation times of dielectric dipoles of photo resist materials are characterized by Cole-Cole plot, which is employed to determine a dielectric relaxation time of dipole moment in polymer structure, based on traditional capacitance method in frequency range of 10mHz to 5MHz. The relaxation time of dry film resist (DFR) can be determined to be 12.1s. The validity of dielectric properties of DFR film as a structural material is discussed.

Citation Download Citation

Hiroki Sasazaki and Akira Kawai "Relaxation properties of dielectric dipoles of photo resist materials", Proc. SPIE 7520, Lithography Asia 2009, 75202X (14 December 2009); https://doi.org/10.1117/12.841126

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