Mask lithography for display manufacturing

T. Sandstrom; P. Ekberg

doi:10.1117/12.865780

15 May 2010 Mask lithography for display manufacturing

T. Sandstrom, P. Ekberg

Proceedings Volume 7545, 26th European Mask and Lithography Conference; 75450K (2010) https://doi.org/10.1117/12.865780
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France

Abstract

The last ten years have seen flat displays conquer our briefcases, desktops, and living rooms. There has been an enormous development in production technology, not least in lithography and photomasks. Current masks for large displays are more than 2 m² and make 4-6 1X prints on glass substrates that are 9 m². One of the most challenging aspects of photomasks for displays is the so called mura, stripes or blemishes which cause visible defects in the finished display. For the future new and even tighter maskwriter specifications are driven by faster transistors and more complex pixel layouts made necessary by the market's wish for still better image quality, multi-touch panels, 3D TVs, and the next wave of e-book readers. Large OLED screens will pose new challenges. Many new types of displays will be lowcost and use simple lithography, but anything which can show video and high quality photographic images needs a transistor backplane and sophisticated masks for its production.

Citation Download Citation

T. Sandstrom and P. Ekberg "Mask lithography for display manufacturing", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450K (15 May 2010); https://doi.org/10.1117/12.865780

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