Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses

Jun-ichi Kushibiki; Mototaka Arakawa; Yuji Ohashi; Toshio Sannomiya; Yuko Maruyama

doi:10.1117/12.846570

22 March 2010 Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glasses

Jun-ichi Kushibiki, Mototaka Arakawa, Yuji Ohashi, Toshio Sannomiya, Yuko Maruyama

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Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76362M (2010) https://doi.org/10.1117/12.846570
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

This paper presents the development of a practical system for super-precise evaluation of zero-CTE temperatures T(zero- CTE) of TiO₂-SiO₂ glasses for extreme ultraviolet lithography (EUVL) by measuring leaky surface-acoustic-wave (LSAW) velocity VLSAW with a line-focus-beam ultrasonic material characterization (LFB-UMC) system. This new system can evaluate T(zero-CTE) from 20 to 150°C on the surfaces of glass substrates for photomasks and optical mirrors located at different positions in EUVL systems. This system operates in a stabilized temperature measurement environment (e.g., 23.00°C). It was demonstrated at 225 MHz for homogenized TiO₂-SiO₂ glass specimens with different annealing temperatures and realized an extremely homogeneous glass ingot with a ΔT(zero-CTE) of 1.6°C around 23.2°C. This ultrasonic system enables both glass manufacturers and users to speedily inspect all glass substrates with reliable data of T(zero-CTE).

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Jun-ichi Kushibiki, Mototaka Arakawa, Yuji Ohashi, Toshio Sannomiya, and Yuko Maruyama "Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glasses", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362M (22 March 2010); https://doi.org/10.1117/12.846570

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