Tin ion and neutral dynamics within an LPP EUV source

Bob Rollinger; Oran Morris; Ndaona Chokani; Reza S. Abhari

doi:10.1117/12.846557

22 March 2010 Tin ion and neutral dynamics within an LPP EUV source

Bob Rollinger, Oran Morris, Ndaona Chokani, Reza S. Abhari

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76363F (2010) https://doi.org/10.1117/12.846557
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The life-time of normal incidence collectors used in LPP EUV sources has been computationally investigated. A two-dimensional/ axisymmetric hydrodynamic-particle code is used to model the plasma expansion from the laser-droplet interaction up to the collector optic. The plasma is formed from the interaction of a Nd:YAG laser, operating at the fundamental frequency, with 50μm tin droplets. The simulation results show non-uniform mass-density distributions at the end of the laser pulse. As the expansion continues up to the collector, the non-uniformities continue to develop. Sn⁵⁺ is the most energetic ion impinging on the collector, with kinetic energies up to 7keV. The sputtering yields for Sn ions onto Mo and Si show a strong dependence on both the ion energy and their impact angle. The deposition of neutral tin atoms on the collector has also been assessed with a large scale hydrodynamic simulation. These results are used to investigate the build-up of tin vapor at the irradiation site.

Citation Download Citation

Bob Rollinger, Oran Morris, Ndaona Chokani, and Reza S. Abhari "Tin ion and neutral dynamics within an LPP EUV source", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363F (22 March 2010); https://doi.org/10.1117/12.846557

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