Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography

Hiroki Yamamoto; Takahiro Kozawa; Seiichi Tagawa; Tomoyuki Ando; Katsumi Ohmori; Mitsuru Sato; Junichi Onodera

doi:10.1117/12.846391

29 March 2010 Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Tomoyuki Ando, Katsumi Ohmori, Mitsuru Sato, Junichi Onodera

Author Affiliations +

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76390U (2010) https://doi.org/10.1117/12.846391
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We developed negative-tone chemically amplified molecular resists based on a fullerene derivative and evaluated the lithographic performance using 75 keV electron beam (EB) exposure tool to explore the potential of fullerene derivatives as a negative-type EB resist with high resolution and high etching durability. The etching rate of fullerene derivatives is lower than that of conventional resist materials such as PHS, ZEP530 and UVIII. Although a dose of 800 μC/cm² is required, 60 nm line resolution and aspect ratio five was obtained in best of four kinds of fullerene derivative films. Also, the effect of acid generators to a fullerene derivative resists were investigated. Fullerene derivative resists are a promising candidate for nanolithography because it is essential for next generation lithography to have high aspect ratio related collapse of high resolution pattern and high etching durability in ultra-thin films.

Citation Download Citation

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Tomoyuki Ando, Katsumi Ohmori, Mitsuru Sato, and Junichi Onodera "Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76390U (29 March 2010); https://doi.org/10.1117/12.846391

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