Study on the preparation of a high diffraction efficiency Dammann grating with subwavelength structure

Yanbing Leng; Lianhe Dong; Yanjun Sun

doi:10.1117/12.867091

6 October 2010 Study on the preparation of a high diffraction efficiency Dammann grating with subwavelength structure

Yanbing Leng, Lianhe Dong, Yanjun Sun

Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 765524 (2010) https://doi.org/10.1117/12.867091
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

Based on the couple-wave analysis theory and the genetic algorithm, a high diffraction efficiency dammann grating with subwavelength structure has been designed and prepared. The array number of diffractive spots is 9 and the feature size achieves 0.92μm. The diffraction efficiency of the grating reaches 92%. By using Electron Beam Direct Writing and Reactive Ion Etching, we patterned the subwavelength structure on the silica. The experimental results show that the subwavelength structure with nanometer resolution can be patterned by computer controlled electron beam scanning exposure. In reactive ion etching, the etching rate and the grating line-shape can be affected by radio frequency (RF) power, system pressure and gas flow. When there are pressure of 6 pa and gas flow of 35cm3/min steadily, etching rate increases nonlinearly with RF power and reaches the peak at 350W. While RF power is higher than 350W, etching rate descends with its increasing and surfaces of grating groove become rough and burned deformed easily. When the RF power and gas flow are steadily, etching rate increases with system pressure reaches the peak at 13Pa, then descends. On the contrary, when the RF power and system pressure are steadily, etch rate decreases with the increase of the gas flow. This paper also analyzes the linewidth error in Electron Beam Direct Writing.

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Yanbing Leng, Lianhe Dong, and Yanjun Sun "Study on the preparation of a high diffraction efficiency Dammann grating with subwavelength structure", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 765524 (6 October 2010); https://doi.org/10.1117/12.867091

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KEYWORDS

Etching

Diffraction gratings

Diffraction

Reactive ion etching

Electron beams

Ions

Optical design

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