The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering

Yongfeng Ju; Zhiming Wu; Yonglong Qiu; Lin Li; Yadong Jiang

doi:10.1117/12.865917

28 October 2010 The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering

Yongfeng Ju, Zhiming Wu, Yonglong Qiu, Lin Li, Yadong Jiang

Author Affiliations +

Proceedings Volume 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology; 76584K (2010) https://doi.org/10.1117/12.865917
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

In this investigation, a novel heat-sensitive material titanium oxide (TiO_x) thin film was deposited on well cleaned K9 glass substrates by d.c. reactive magnetron sputtering from a metallic titanium target in an Ar + O₂ gas mixture. In order to obtain proper TiO_x thin films, deposition parameters should be properly controlled. In our system, TiO_x thin films were obtained at different substrate temperature while total pressure and oxygen partial pressure were kept at 1 Pa and 0.6 Pa, d.c. power of 100 W, and the deposition time was adjusted in order to deposit thin films with a constant thickness close to 200 nm. The crystalline structure was characterized by X-ray diffraction (XRD) analysis and the results show that all the deposited films have an amorphous structure. In this paper, we have mainly investigated the dependence of electrical and optical properties of the reactively sputtered TiO_x thin films on the different substrate temperature during the sputtering process, i.e., as the K9 glass substrate temperature increases from 100 °C to 250°C, the sheet resistance Rs of TiO_x thin films is ranged from 305 kΩ/square to 36 kΩ/square, temperature coefficient of resistance (TCR) value up to -2.12 %/K is obtained, optical band gap decreases from 3.34 eV to 3.28 eV. Through the analysis and discussion of the above experimental data, we could obtain the conclusion that the variation in substrate temperature during the sputtering deposition plays a considerable important role in the electrical and optical properties of all the deposited films.

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Yongfeng Ju, Zhiming Wu, Yonglong Qiu, Lin Li, and Yadong Jiang "The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering", Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76584K (28 October 2010); https://doi.org/10.1117/12.865917

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KEYWORDS

Thin films

Resistance

Sputter deposition

Thin film deposition

Oxides

Titanium

Optical properties

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