Paper
28 April 2010 Fabrication of regular patterned SERS arrays by electron beam lithography
U. Huebner, H. Schneidewind, D. Cialla, K. Weber, M. Zeisberger, R. Mattheis, R. Moeller, J. Popp
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Abstract
Due to its enormous signal intensity and high fingerprint sensitivity, surface enhanced Raman spectroscopy (SERS) is a powerful technique in chemical and biological applications. Our goal is the employment of the SERS technique for (bio)analytical devices. A main feature in order to achieve a versatile applicability is to ensure a reproducible and homogeneous signal across large measuring areas. Electron beam lithography is an adequate approach to assemble such reproducible arrays. Within this contribution, the fabrication process of regular patterned nanostructures based on electron beam lithography and argon ion beam etching is described. Using the exposure of crossed gratings of lines within a resist layer, gold nanorhomb and nanorectangle arrays are produced on a quartz wafer. The patterns are periodically arranged with pitches of 200 to 400 nm and exhibit sharp edges with corner radii of less than 10 nm. The pattern dimensions in combination with the small edge radii yield a high electromagnetic field enhancement caused by plasmonic excitation. The SERS arrays were characterized by means of SEM and were tested with respect to their SERS response, especially with regard to their reproducibility.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
U. Huebner, H. Schneidewind, D. Cialla, K. Weber, M. Zeisberger, R. Mattheis, R. Moeller, and J. Popp "Fabrication of regular patterned SERS arrays by electron beam lithography", Proc. SPIE 7715, Biophotonics: Photonic Solutions for Better Health Care II, 771536 (28 April 2010); https://doi.org/10.1117/12.854184
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Cited by 4 scholarly publications.
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KEYWORDS
Surface enhanced Raman spectroscopy

Electron beam lithography

Gold

Etching

Raman spectroscopy

Ion beams

Crystals

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