Spatially localized UV-induced crystallization of SnO2 in photorefractive SiO2-SnO2 thin film

B. N. Shivakiran Bhaktha; Simone Berneschi; Gualtiero Nunzi Conti; Giancarlo C. Righini; Andrea Chiappini; Alessandro Chiasera; Maurizio Ferrari; Sylvia Turrell

doi:10.1117/12.854894

17 May 2010 Spatially localized UV-induced crystallization of SnO₂ in photorefractive SiO₂-SnO₂ thin film

B. N. Shivakiran Bhaktha, Simone Berneschi, Gualtiero Nunzi Conti, Giancarlo C. Righini, Andrea Chiappini, Alessandro Chiasera, Maurizio Ferrari, Sylvia Turrell

Author Affiliations +

Proceedings Volume 7719, Silicon Photonics and Photonic Integrated Circuits II; 77191B (2010) https://doi.org/10.1117/12.854894
Event: SPIE Photonics Europe, 2010, Brussels, Belgium

Abstract

We report on the formation of spatially localized crystals in SiO₂-SnO₂ thin films fabricated by the sol-gel technique. This material presents an intense absorption band (α≈10³cm^-1) in the UV region. A continuous wave UV laser operating at 266nm focused through a microscope objective is used as an effective tool to modify locally the matrix containing photorefractive SnO₂. The UV micro-Raman spectrometer is used to study the evolution of SnO₂ crystals in the thin film. The appearance of the Raman scattering peak at 621cm^-1, assigned to the A_1g mode of rutile SnO₂, confirms the formation of nanocrystals in the focalised UV irradiated zone.

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B. N. Shivakiran Bhaktha, Simone Berneschi, Gualtiero Nunzi Conti, Giancarlo C. Righini, Andrea Chiappini, Alessandro Chiasera, Maurizio Ferrari, and Sylvia Turrell "Spatially localized UV-induced crystallization of SnO₂ in photorefractive SiO₂-SnO₂ thin film", Proc. SPIE 7719, Silicon Photonics and Photonic Integrated Circuits II, 77191B (17 May 2010); https://doi.org/10.1117/12.854894

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