Paper
17 April 1987 The Application Of Contour Maps And Statistical Control Charts In Monitoring Dielectric Processes
Alan K. Smith, Edward F. Wang
Author Affiliations +
Abstract
For many years the ability to measure dielectric films and then produce a graphic output either in contour map or 3-dimensional form has been either slow or time consuming in labor. With the new generation of equipment on the market this is no longer the case. This paper will describe the operation of this equipment in obtaining contour maps of several typical processes and the use of these maps in the evaluation of these processes and related equipment. The advantage of advanced computer technology also allows the data to be collated for the generation of process control charts within seconds of the collection of the data. The use of these control charts will also be demonstrated.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan K. Smith and Edward F. Wang "The Application Of Contour Maps And Statistical Control Charts In Monitoring Dielectric Processes", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940406
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KEYWORDS
Semiconducting wafers

Process control

Dielectrics

Oxides

Reactive ion etching

Inspection

Integrated circuits

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