Spectroscopic ellipsometry of a-Si/SiO2 large waveband coating for the JWST-FGS-TFI etalon plates fabrication

Michel Poirier; Clinton Evans; Craig Haley; Driss Touahri; Rene Doyon

doi:10.1117/12.863034

19 August 2010 Spectroscopic ellipsometry of a-Si/SiO₂ large waveband coating for the JWST-FGS-TFI etalon plates fabrication

Michel Poirier, Clinton Evans, Craig Haley, Driss Touahri, Rene Doyon

Author Affiliations +

Proceedings Volume 7786, Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI; 77860M (2010) https://doi.org/10.1117/12.863034
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

Previous publications for the JWST-FGS-TFI instrument described the design and fabrication of mirror coatings for scanning Fabry-Perot etalons. Since that time, we have extended the fabrication process using ellipsometry analysis over the full operational bandwidth from 1.0 to 5.0 microns for both mirror and anti-reflection coatings. This paper will present single and multiple layer ellipsometry analysis of the a-Si/SiO₂ optical properties. Analysis improvement came from a-Si/SiO₂ interface consideration and simultaneous use of ellipsometric data from Woollam V-VASE and IRVASE instruments. Simulations of reflectance and transmittance based on the ellipsometric analysis results will also be compared to spectrophotometric measurements for witness pieces.

Citation Download Citation

Michel Poirier, Clinton Evans, Craig Haley, Driss Touahri, and Rene Doyon "Spectroscopic ellipsometry of a-Si/SiO₂ large waveband coating for the JWST-FGS-TFI etalon plates fabrication", Proc. SPIE 7786, Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI, 77860M (19 August 2010); https://doi.org/10.1117/12.863034

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