Justification For Infrared Microimaging In The Design, Manufacture, Test And Screening Of Semiconductor Microcircuits

Robert B. McIntosh

doi:10.1117/12.940508

11 May 1987 Justification For Infrared Microimaging In The Design, Manufacture, Test And Screening Of Semiconductor Microcircuits

Robert B. McIntosh

Author Affiliations +

Proceedings Volume 0780, Thermosense IX: Thermal Infrared Sensing for Diagnostics and Control; (1987) https://doi.org/10.1117/12.940508
Event: 1987 Technical Symposium Southeast on Optics, Electro-Optics, and Sensors, 1987, Orlando, FL, United States

Abstract

The applications and potential reliability and cost benefits of infrared microimaging are reviewed. Examples of cost savings are presented to help justify investment in infrared inspection technology and tools.

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Robert B. McIntosh "Justification For Infrared Microimaging In The Design, Manufacture, Test And Screening Of Semiconductor Microcircuits", Proc. SPIE 0780, Thermosense IX: Thermal Infrared Sensing for Diagnostics and Control, (11 May 1987); https://doi.org/10.1117/12.940508

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