Photomask Japan 2010 panel discussion overview

Yoshinori Nagaoka; Hiroshi Mohri; Shinji Akima

doi:10.1117/12.868534

24 September 2010 Photomask Japan 2010 panel discussion overview

Yoshinori Nagaoka, Hiroshi Mohri, Shinji Akima

Proceedings Volume 7823, Photomask Technology 2010; 782306 (2010) https://doi.org/10.1117/12.868534
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

Photomask Japan each year hosts a meeting inviting the conference attendees to actively participate in a discussion on a selected topic. The topic selected for this year is on new mask inspection and metrology techniques that are just emerging in the market, namely, aerial/wafer image based inspection and metrology, and optical high sampling frequency CD uniformity measurement. The panel discussion hopes to identify potential values of each technique and at the same time discover any challenge if the industry were to adopt such technique.

Citation Download Citation

Yoshinori Nagaoka, Hiroshi Mohri, and Shinji Akima "Photomask Japan 2010 panel discussion overview", Proc. SPIE 7823, Photomask Technology 2010, 782306 (24 September 2010); https://doi.org/10.1117/12.868534

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