High performance photomask technology with the advanced binary film

Koji Murano; Kosuke Takai; Kunihiro Ugajin; Machiko Suenaga; Takeharu Motokawa; Masato Saito; Tomotaka Higaki; Osamu Ikenaga; Hidehiro Watanabe

doi:10.1117/12.866015

24 September 2010 High performance photomask technology with the advanced binary film

Koji Murano, Kosuke Takai, Kunihiro Ugajin, Machiko Suenaga, Takeharu Motokawa, Masato Saito, Tomotaka Higaki, Osamu Ikenaga, Hidehiro Watanabe

Author Affiliations +

Proceedings Volume 7823, Photomask Technology 2010; 78232W (2010) https://doi.org/10.1117/12.866015
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

A new photomask technology with the Advanced Binary Film (ABF) by HOYA has been established. The film of relatively low thickness is expected to show the best lithography performance. The simple film structure of thin film of chemically amplified resist, as a mask layer for etching, on the thin ABF film enables us to obtain sub-50nm small features in a photomask. The thinness of the film also helps to avoid pattern collapse in cleaning steps. The photomask with ABF expecting the best currently available lithography performance shows the best achievable durability for use in ArF lithography process steps and the best attainable feasibility in the fabrication process steps for leading edge photomasks.

Citation Download Citation

Koji Murano, Kosuke Takai, Kunihiro Ugajin, Machiko Suenaga, Takeharu Motokawa, Masato Saito, Tomotaka Higaki, Osamu Ikenaga, and Hidehiro Watanabe "High performance photomask technology with the advanced binary film", Proc. SPIE 7823, Photomask Technology 2010, 78232W (24 September 2010); https://doi.org/10.1117/12.866015

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