Paper
21 February 2011 High aspect ratio taper-free micro and nano-channel fabrication in glass with ultrafast nondiffracting Bessel beams
F. Courvoisier, M. K. Bhuyan, M. Jacquot, P. A. Lacourt, R. Salut, L. Furfaro, John M. Dudley
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Abstract
Ultrafast laser pulses are a powerful tool to process dielectrics. Here, we review our recent work concerning high aspect ratio micro and nanochannel processing in glass. We show how femtosecond Bessel beams overcome many of the difficulties associated with Gaussian beams. We report on single shot processing of nanochannels with aspect ratio up to 100. Underlying physical phenomena are discussed.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Courvoisier, M. K. Bhuyan, M. Jacquot, P. A. Lacourt, R. Salut, L. Furfaro, and John M. Dudley "High aspect ratio taper-free micro and nano-channel fabrication in glass with ultrafast nondiffracting Bessel beams", Proc. SPIE 7921, Laser-based Micro- and Nanopackaging and Assembly V, 79210K (21 February 2011); https://doi.org/10.1117/12.875409
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KEYWORDS
Bessel beams

Glasses

Gaussian beams

Plasma

Femtosecond phenomena

Nanolithography

Dielectrics

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