Photolithographic fabrication of slot waveguides

Alexander Spott; Ran Ding; Tom Baehr-Jones; Woo-Joong Kim; Xugang Xiong; Richard Bojko; Jean-Marc Fedeli; Maryse Fournier; Michael Hochberg

doi:10.1117/12.876093

4 February 2011 Photolithographic fabrication of slot waveguides

Alexander Spott, Ran Ding, Tom Baehr-Jones, Woo-Joong Kim, Xugang Xiong, Richard Bojko, Jean-Marc Fedeli, Maryse Fournier, Michael Hochberg

Author Affiliations +

Proceedings Volume 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV; 792704 (2011) https://doi.org/10.1117/12.876093
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

Silicon nano-slot waveguides have proven to be useful for a variety of applications, including nonlinear optics, biosensing, and electrooptic modulation. In particular, an electrooptic polymer clad, electrically contacted, strip-loaded slot waveguide design has been shown to be particularly useful for high-bandwidth electrooptic modulators. One of the significant challenges for many of the applications of these waveguides is the necessity of low waveguide losses. We demonstrate the ability to fabricate single mode strip-loaded slot waveguides, with losses as low as 6.5 dB/cm, using conventional stepper-based photolithography. Additionally, we discuss the benefits of an asymmetric slot waveguide design and present improved losses as low as 2 dB/cm for both asymmetric strip-loaded slot waveguides and regular asymmetric slot waveguides fabricated in a different photolithographic process.

Citation Download Citation

Alexander Spott, Ran Ding, Tom Baehr-Jones, Woo-Joong Kim, Xugang Xiong, Richard Bojko, Jean-Marc Fedeli, Maryse Fournier, and Michael Hochberg "Photolithographic fabrication of slot waveguides", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 792704 (4 February 2011); https://doi.org/10.1117/12.876093

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