DWDM DFB LD fabricated by nanoimprint process

Wen Liu; Lei Wang; Ning Zhou; Yiwen Zhang; Fei Qiu; Zhimou Xu

doi:10.1117/12.876774

14 February 2011 DWDM DFB LD fabricated by nanoimprint process

Wen Liu, Lei Wang, Ning Zhou, Yiwen Zhang, Fei Qiu, Zhimou Xu

Proceedings Volume 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV; 79270W (2011) https://doi.org/10.1117/12.876774
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

DFB LDs are key components in DWDM optical network. Now they are very expensive because the feedback grating period has to be controlled with very high accuracy and EBL is currently the most popular solution. We propose a high throughput, low cost NIL process based on a large stamp fabricated by SFIL and soft stamp pattern transfer method. DFB chips on 30mm*30mm area were manufactured with both good uniformity and performance. 13 ITU channels from 1540nm to 1560nm of 200GHz space are made. Our results show NIL has high potential to become another popular technology for DFB LD production, this cost effective and high efficiency manufacture solution may yield a significant impact to the future optical communication industry development.

Citation Download Citation

Wen Liu, Lei Wang, Ning Zhou, Yiwen Zhang, Fei Qiu, and Zhimou Xu "DWDM DFB LD fabricated by nanoimprint process", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79270W (14 February 2011); https://doi.org/10.1117/12.876774

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