Improved Microphotographic Systems In The Semiconductor Industry

H. Philippaerts; W. Vanassche; R. Duville

doi:10.1117/12.954832

20 September 1976 Improved Microphotographic Systems In The Semiconductor Industry

H. Philippaerts, W. Vanassche, R. Duville

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954832
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

Experimental work on a new photographic material and associated process technology. are described with reference to the requirements of the manufacturers of advanced micro electronic devices with high, packing density. The microphotographic process is demonstrated practically for contact printing in a negative situation as well as in a positive/positive situation. The capacity of the new microphotographic process to control accurately the initial dimensions on the micro-image is of great significance in order to define the geolletry of the device to be designed.

Citation Download Citation

H. Philippaerts, W. Vanassche, and R. Duville "Improved Microphotographic Systems In The Semiconductor Industry", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954832

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available