Paper
31 August 2011 Waveguide crossing characterization for silica planar lightwave circuits
Author Affiliations +
Proceedings Volume 8007, Photonics North 2011; 80070P (2011) https://doi.org/10.1117/12.902933
Event: Photonics North 2011, 2011, Ottawa, Canada
Abstract
Optical waveguide crossings based on silica-on-silicon technology are investigated. The effect of crossing angle (θ) on light transmitted at through and cross-port on a sequence of waveguide crossings with angle varying from 7 to 28° is modeled and experimentally validated. Results demonstrate that structures with small footprint (θ≈9°) can achieve low crosstalk of -32 dB with high throughput, insensitivity to wavelength of operation, low polarization dependent loss of 0.6 dB, and low sensitivity to fabrication tolerances. As a result, waveguide crossings with small crossing angle present an attractive approach to reducing the overall component footprint without compromising the performance.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Celo, P. Dumais, S. Paquet, J. Seregelyi, and C. Callender "Waveguide crossing characterization for silica planar lightwave circuits", Proc. SPIE 8007, Photonics North 2011, 80070P (31 August 2011); https://doi.org/10.1117/12.902933
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KEYWORDS
Waveguides

Polarization

Refractive index

Silica

Photonic integrated circuits

Tolerancing

Semiconducting wafers

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