A scattering matrix interpolation from perturbation method: application to scatterometry for profile control

Kofi Edee; Jean-Pierre Plumey; Gérard Granet

doi:10.1117/12.889214

23 May 2011 A scattering matrix interpolation from perturbation method: application to scatterometry for profile control

Kofi Edee, Jean-Pierre Plumey, Gérard Granet

Author Affiliations +

Proceedings Volume 8083, Modeling Aspects in Optical Metrology III; 80830O (2011) https://doi.org/10.1117/12.889214
Event: SPIE Optical Metrology, 2011, Munich, Germany

Abstract

The scatterometric and electromagnetic signatures of a pattern are computing with the perturbation method combined with the Fourier Modal Method (FMM) in order to reduce computational time. In electromagnetic point of view, the grating is characterized by its scattering matrix which allows the computation of the reflection and transmission coefficient. A slight variation of profile parameters or electrical ones provides a small fluctuation of the scattering matrix, consequently, an analytical expression of the local behavior of its eigenvectors and eigenvalues can be obtained by using a perturbation method.

Citation Download Citation

Kofi Edee, Jean-Pierre Plumey, and Gérard Granet "A scattering matrix interpolation from perturbation method: application to scatterometry for profile control", Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 80830O (23 May 2011); https://doi.org/10.1117/12.889214

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