Paper
4 October 2011 Aluminum based multilayers systems synthesized by ion beam sputtering for extreme UV
A. Ziani, F. Delmotte, C. Le Paven-Thivet, E. Meltchakov, F. Bridou, A. Jérome, M. Roulliay, K. Gasc
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Abstract
In this paper, we present the development of Al-based multilayer mirrors for the spectral range [17 nm - 34 nm]. The purpose of presented study is to optimize the deposition of Al-based multilayers by the ion beam sputtering (IBS) technique according to several parameters such as the ion beam current and the angle of inclination of targets, which allowed us to vary the energy of ad-atoms deposited onto a substrate. We expected to achieve good reflectivity values for both two- and three-material stacks: aluminum/molybdenum Al/Mo, aluminum/molybdenum/boron carbide Al/Mo/B4C and aluminum/molybdenum/silicon carbide Al/Mo/SiC. We have undertaken a series of structural and chemical analyses of these systems. We present their optical characteristics in the EUV range.
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A. Ziani, F. Delmotte, C. Le Paven-Thivet, E. Meltchakov, F. Bridou, A. Jérome, M. Roulliay, and K. Gasc "Aluminum based multilayers systems synthesized by ion beam sputtering for extreme UV", Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681S (4 October 2011); https://doi.org/10.1117/12.896433
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KEYWORDS
Reflectivity

Aluminum

Ion beams

Mirrors

Sputter deposition

Multilayers

Extreme ultraviolet

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