Paper
7 February 2012 Sensitization of erbium through silicon nanocrystals in silicon rich oxide
M. Q. Huda
Author Affiliations +
Proceedings Volume 8257, Optical Components and Materials IX; 825702 (2012) https://doi.org/10.1117/12.909765
Event: SPIE OPTO, 2012, San Francisco, California, United States
Abstract
The process of erbium sensitization through silicon nanocrystals (Si-nc) in silicon rich oxide host is analyzed through a model involving five levels of Er energy states. Energy transfer processes from Si-nc to Er, and mechanisms involving deteriorating effects in Er sensitization are studied. It is proposed that Er atoms are excited through quasi-direct processes involving excitonic recombinations in Si-nc. An effective range of 1.3 nm is estimated for erbium sensitization through Si-nc. Effects of multiple excitation of Si-nc during an erbium lifecycle is analyzed. It is shown that, the fraction of Si-nc that is repeatedly excited at every alternate cycle of excitation increases from small fractions to percentage levels for incident flux levels above 1018/cm2-s. For typical values of Er and Si-nc incorporation, saturating effects in Er luminescence is found to start at flux levels much lower than that for Si-nc excitation. Occurrence of multiple excitation of Si-nc is correlated with the deteriorating effects in Er sensitization at higher flux incidence. Simulated results with our model are in good agreement with reported data of Er luminescence through Si-nc sensitization.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Q. Huda "Sensitization of erbium through silicon nanocrystals in silicon rich oxide", Proc. SPIE 8257, Optical Components and Materials IX, 825702 (7 February 2012); https://doi.org/10.1117/12.909765
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KEYWORDS
Erbium

Silicon

Chemical species

Nanocrystals

Luminescence

Oxides

Energy transfer

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