Paper
21 March 2012 Zone plate focused soft x-ray lithography for fabrication of nanofluidic devices
Adam F. G. Leontowich, Adam P. Hitchcock
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Abstract
Sealed nanofluidic channels with cross sections of sub-100 nm * 100 nm were created in a polymer bilayer using the focused soft X-rays of a scanning transmission X-ray microscope and the direct write method. The width of the nanochannels can be controlled by the area patterned in X and Y, while the height can be controlled by tuning the layer thicknesses. Formation of the desired structures has been confirmed by near edge X-ray absorption fine structure spectromicroscopy and scanning electron microscopy. The maximum length of the nanochannels fabricated by this method was found to be limited by the efficiency of excavation of patterned material out of the channel, as well as the stability of the polymer over-layer which seals it. Schemes toward interfacing these nanochannels with conventional microfluidics are discussed.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adam F. G. Leontowich and Adam P. Hitchcock "Zone plate focused soft x-ray lithography for fabrication of nanofluidic devices", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231D (21 March 2012); https://doi.org/10.1117/12.915803
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Polymethylmethacrylate

X-rays

Absorption

Optical lithography

X-ray lithography

Nanolithography

Polymers

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