Influence of illumination mode to lithographic imaging

Yong Liu; Tingwen Xing; Xiong Yang

doi:10.1117/12.956499

15 October 2012 Influence of illumination mode to lithographic imaging

Yong Liu, Tingwen Xing, Xiong Yang

Proceedings Volume 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing; 84201C (2012) https://doi.org/10.1117/12.956499
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination.

Citation Download Citation

Yong Liu, Tingwen Xing, and Xiong Yang "Influence of illumination mode to lithographic imaging", Proc. SPIE 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing, 84201C (15 October 2012); https://doi.org/10.1117/12.956499

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