Development of plant-based resist material derived from biomass on hardmask layer in ultraviolet curing nanoimprint lithography

Satoshi Takei

doi:10.1117/12.924636

8 May 2012 Development of plant-based resist material derived from biomass on hardmask layer in ultraviolet curing nanoimprint lithography

Satoshi Takei

Author Affiliations +

Proceedings Volume 8428, Micro-Optics 2012; 84281U (2012) https://doi.org/10.1117/12.924636
Event: SPIE Photonics Europe, 2012, Brussels, Belgium

Abstract

Nanopatterning printability due to high sensitivity and low film thickness shrinkage of ultraviolet curing process in resist material was one of key to achieve high resolution and quality of nanoimprint lithography. The new ultraviolet curing plant-based resist material derived from biomass was investigated to achieve high quality of 100 nm line and space patterning images in the optimized conditions of ultraviolet curing nanoimprint lithography technology for the optical films containing light-emitting diodes, solar cell devices, actuators, biosensors, and micro electro mechanical systems. The newly plantbased resist material derived from biomass is expected as one of the nanoimprint lithography technology in next generation optical devices and biosensors.

Citation Download Citation

Satoshi Takei "Development of plant-based resist material derived from biomass on hardmask layer in ultraviolet curing nanoimprint lithography", Proc. SPIE 8428, Micro-Optics 2012, 84281U (8 May 2012); https://doi.org/10.1117/12.924636

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