Fabrication of subwavelength holes using nanoimprint lithography

A. Weiss; J. Besser; M. Baum; R. Saupe; T. Otto; T. Gessner

doi:10.1117/12.2014273

5 March 2013 Fabrication of subwavelength holes using nanoimprint lithography

A. Weiss, J. Besser, M. Baum, R. Saupe, T. Otto, T. Gessner

Proceedings Volume 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI; 86131N (2013) https://doi.org/10.1117/12.2014273
Event: SPIE MOEMS-MEMS, 2013, San Francisco, California, United States

Abstract

Driven by the demand of miniaturized and highly integrated functionalities in the area of photonics and photonic circuits, the metal or plasmon optics has become a promising method for manipulating light at the nanometer scale. Especially the application of periodic sub wavelength hole structures within an opaque metal film on a dielectric substrate holds many advantages for the realization of optical filters, since the variation of the hole diameter and the periodicity allows a selective filter response. This paper is concerned with the modeling, fabrication and characterization of a sub wavelength hole array for surface plasmon enhanced transmission of light [1]. The theoretical backgrounds as well as the basics of the simulation by Finite-Difference Time-Domain (FDTD) are described for the target structure with a hole diameter of 180 nm and a periodicity of 400 nm. By using a double-molding technology via nanoimprint lithography the fabrication of this sub wavelength hole array with a peak wavelength of 470 nm and full width at half maximum of 50 nm from a silicon nanopillar master is demonstrated. In order to ensure the dimensional stability of the molded structures, characterization was consequently done by means of a self made non-contact mode atomic force microscope.

Citation Download Citation

A. Weiss, J. Besser, M. Baum, R. Saupe, T. Otto, and T. Gessner "Fabrication of subwavelength holes using nanoimprint lithography", Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 86131N (5 March 2013); https://doi.org/10.1117/12.2014273

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