Paper
13 March 2013 Impact of thermal oxidation, surface chemistry and porous silicon morphology for sensing applications
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Abstract
An ideal diagnostic device should be inexpensive, easy-to-use, rapid and reliable. Nanostructured porous silicon (PSi) satisfies these criterions including label-free optical detection and high throughput detection. Pore morphology (size, porosity) must be tailored for each specific application, and for immunosensing applications PSi morphology has been optimized for maximal pore infiltration of larger proteins as immuno gamma globlulin (IgG). Sensor degradation by high salt concentration induces a baseline drift. Different thermal oxidation procedures have been studied in order to obtain a stable sensor in the 3 hour incubation period of the immunoassay with negligible drift
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. A. Kolmychek, D. A. Kopylov, T. V. Murzina, F. Baldini, S. Berneschi, D. Farnesi, A. Giannetti, S. Tombelli, G. Nunzi Conti, and S. Soria "Impact of thermal oxidation, surface chemistry and porous silicon morphology for sensing applications", Proc. SPIE 8627, Integrated Optics: Devices, Materials, and Technologies XVII, 86271E (13 March 2013); https://doi.org/10.1117/12.2007377
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KEYWORDS
Silicon

Sensors

Thermal oxidation

Reflectivity

Chemistry

Refractive index

Annealing

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