Line edge roughness measurement technique for  fingerprint pattern in block copolymer thin film

Miki Isawa; Kei Sakai; Paulina A. Rincon Delgadillo; Roel Gronheid; Hiroshi Yoshida

doi:10.1117/12.2010915

10 April 2013 Line edge roughness measurement technique for fingerprint pattern in block copolymer thin film

Miki Isawa, Kei Sakai, Paulina A. Rincon Delgadillo, Roel Gronheid, Hiroshi Yoshida

Proceedings Volume 8681, Metrology, Inspection, and Process Control for Microlithography XXVII; 868114 (2013) https://doi.org/10.1117/12.2010915
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Fingerprint edge roughness (FER) is proposed to characterize high frequency roughness of fingerprint pattern edges assembled by lamella forming block copolymer (BCP). The FER is a roughness index which does not include the roughness component of the fingerprint curvature. A technique to evaluate FER by using CD-SEM is also proposed. Centerline of the fingerprint patterns were extracted by utilizing binarization and slimming algorithm, and line width, line width roughness and line edge roughness along the centerline were measured. The FER thus measured showed a good agreement with those determined by utilizing conventional line edge roughness analyzing algorithm. The FERs of fingerprint patterns assembled with various BCP formulations were analyzed. As a result, the proposed technique successfully detected the line edge roughness difference between each BCP formulations with different compositions. The results indicate that the FER might be a useful index to evaluate the patterning performance of BCP as a material for DSA process. The proposed technique will provide a method for fast and easy development of BCP materials and processes

Citation Download Citation

Miki Isawa, Kei Sakai, Paulina A. Rincon Delgadillo, Roel Gronheid, and Hiroshi Yoshida "Line edge roughness measurement technique for fingerprint pattern in block copolymer thin film", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 868114 (10 April 2013); https://doi.org/10.1117/12.2010915

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