In situ dissolution analysis of half-pitch line and space patterns at various resist platforms using high speed atomic force microscopy

Julius Joseph Santillan; Toshiro Itani

doi:10.1117/12.2011373

29 March 2013 In situ dissolution analysis of half-pitch line and space patterns at various resist platforms using high speed atomic force microscopy

Julius Joseph Santillan, Toshiro Itani

Author Affiliations +

Proceedings Volume 8682, Advances in Resist Materials and Processing Technology XXX; 86820I (2013) https://doi.org/10.1117/12.2011373
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Preliminary results of in situ analyses of dissolution of resist patterns of half-pitch (hp) lines and spaces (L/S) using high-speed atomic force microscopy are discussed. Initial experiments were conducted on an EUV-exposed 32 nm hp L/S pattern using a standard concentration (0.26 N) of tetramethylammonium hydroxide (TMAH) developer solution. This was done using a carbon nanofiber-based cantilever tip and after various tool enhancements and optimizations. Difference in the dissolution characteristics of various resist polymers such as polyhydroxystyrene (PHS)-based and hybrid (PHS-methacryl) resists was observed. These results are in agreement with the previously obtained results of measurements performed with 32 nm isolated line patterns on resist films developed with diluted developer solutions (1/20 of 0.26 N TMAH), where the PHS-based resist showed a uniformly dissolved, grain-like dissolution characteristic, while the hybrid resist exhibited resist swelling of the exposed resist film.

Citation Download Citation

Julius Joseph Santillan and Toshiro Itani "In situ dissolution analysis of half-pitch line and space patterns at various resist platforms using high speed atomic force microscopy", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86820I (29 March 2013); https://doi.org/10.1117/12.2011373

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available