Application of atomic layer deposition in nanophotonics

Lasse Karvonen; Antti Säynätjoki; Matthieu Roussey; Markku Kuittinen; Seppo Honkanen

doi:10.1117/12.2042263

8 March 2014 Application of atomic layer deposition in nanophotonics

Lasse Karvonen, Antti Säynätjoki, Matthieu Roussey, Markku Kuittinen, Seppo Honkanen

Proceedings Volume 8988, Integrated Optics: Devices, Materials, and Technologies XVIII; 89880Z (2014) https://doi.org/10.1117/12.2042263
Event: SPIE OPTO, 2014, San Francisco, California, United States

Abstract

We review our recent results on using Atomic Layer Deposition (ALD) in fabrication of nanophotonic waveguide devices. ALD is a unique thin film deposition method providing atomic level control of film composition and thickness, perfect step coverage, and large-area uniformity. We employ the advantages of ALD in connection with Sinanophotonics. We present several new structures based on filling silicon slot waveguides or coating the silicon strip waveguides with ALD-grown materials. Also ALD grown TiO₂ strip waveguides are introduced.

Citation Download Citation

Lasse Karvonen, Antti Säynätjoki, Matthieu Roussey, Markku Kuittinen, and Seppo Honkanen "Application of atomic layer deposition in nanophotonics", Proc. SPIE 8988, Integrated Optics: Devices, Materials, and Technologies XVIII, 89880Z (8 March 2014); https://doi.org/10.1117/12.2042263

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