Optimizing hybrid metrology through a consistent multi-tool parameter set and uncertainty model

R. M. Silver; B. M. Barnes; N. F. Zhang; H. Zhou; A. Vladár; J. Villarrubia; J. Kline; D. Sunday; A. Vaid

doi:10.1117/12.2048225

14 April 2014 Optimizing hybrid metrology through a consistent multi-tool parameter set and uncertainty model

R. M. Silver, B. M. Barnes, N. F. Zhang, H. Zhou, A. Vladár, J. Villarrubia, J. Kline, D. Sunday, A. Vaid

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 905004 (2014) https://doi.org/10.1117/12.2048225
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

There has been significant interest in hybrid metrology as a novel method for reducing overall measurement uncertainty and optimizing measurement throughput (speed) through rigorous combinations of two or more different measurement techniques into a single result. This approach is essential for advanced 3-D metrology when performing model-based critical dimension measurements. However, a number of fundamental challenges present themselves with regard to consistent noise and measurement uncertainty models across hardware platforms, and the need for a standardized set of model parameters. This is of paramount concern when the various techniques have substantially different models and underlying physics. In this paper we present realistic examples using scanning electron microscopy, atomic force microscopy, and optical critical dimension (CD) methods applied to sub-20 nm dense feature sets. We will show reduced measurement uncertainties using hybrid metrology on 15 nm CD features and evaluate approaches to adapt quantitative hybrid metrology into a high volume manufacturing environment.

Citation Download Citation

R. M. Silver, B. M. Barnes, N. F. Zhang, H. Zhou, A. Vladár, J. Villarrubia, J. Kline, D. Sunday, and A. Vaid "Optimizing hybrid metrology through a consistent multi-tool parameter set and uncertainty model", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905004 (14 April 2014); https://doi.org/10.1117/12.2048225

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available