Built-in lens mask lithography

Naoki Ueda; Masaru Sasago; Akio Misaka; Hisao Kikuta; Hiroaki Kawata; Yoshihiko Hirai

doi:10.1117/12.2046060

31 March 2014 Built-in lens mask lithography

Naoki Ueda, Masaru Sasago, Akio Misaka, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai

Proceedings Volume 9052, Optical Microlithography XXVII; 90520I (2014) https://doi.org/10.1117/12.2046060
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Cost effective micro lithography tool is demanded for fine micro devices. However, resolution of a conventional proximity exposure system is not sufficient below several micron feature size for deep focus depth. On the other hand, a reduction projection system is sufficient to resolve it but the cost of the tool is too much high compared to proximity exposure systems. To enhance the resolution of photolithography, there has been proposed a number of novel methods beside shorting of wave length. Some of them are utilized in current advanced lithography systems, for example, the immersion lithography¹ enhances effective NA and the phase shift mask² improves optical transmittance function. However, those advanced technology is mainly focused on improvement for advanced projection exposure systems for ultra-fine lithography. On the other hand, coherence holography pattering is recently proposed and expected for 3-dimentional pattering^3-5. Also, Talbot lithography^6-8 is studied for periodical micro and nano pattering. Those novels pattering are based on wave propagation due to optical diffraction without using expensive optical lens systems. In this paper we newly propose novel optical lithography using built-in lens mask to enhance resolution and focus depth in conventional proximity exposure system for micro lithographic application without lens systems. The performance is confirmed by simulation and experimental works.

Citation Download Citation

Naoki Ueda, Masaru Sasago, Akio Misaka, Hisao Kikuta, Hiroaki Kawata, and Yoshihiko Hirai "Built-in lens mask lithography", Proc. SPIE 9052, Optical Microlithography XXVII, 90520I (31 March 2014); https://doi.org/10.1117/12.2046060

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available