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The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), “Title of Paper,” in Scanning Microscopies 2014, edited by Michael T. Postek, Dale E. Newbury, S. Frank Platek, Tim K. Maugel, Proceedings of SPIE Vol. 9236 (SPIE, Bellingham, WA, 2014) Article CID Number. ISSN: 0277-786X ISBN: 9781628412994 Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2014, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/14/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print and on CD-ROM. Papers are published as they are submitted and meet publication criteria. A unique, consistent, permanent citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online, print, and electronic versions of the publication. SPIE uses a six-digit CID article numbering system in which:
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Conference CommitteeConference Chairs
Conference Program Committee
Session Chairs
Poster Session IntroductionThe SPIE Scanning Microscopies 2014 symposium (Conference 9236) brought microscopists from all aspects of scanning microscopies, from scanned optics and probes to scanned particle beams, together in a single forum to discuss current research and new advancements in the field. For the first time, in 2014 Scanning Microscopies was co-located with SPIE Photomask Technology in Monterey, California, United States. The co-locating of the two conferences was very synergistic because of the reliance of the photomask industry on scanned microscopies, so two joint sessions were designed to take advantage of potential technology transfer between the two conferences. The Scanning Microscopies conferences have been typically instrument- and technique-intensive. With that in mind, two joint sessions with the Photomask Technology symposium (Conference 9235) were designed to “cross-pollinate” between the two conferences. Invited presentations of joint conference interest were offered, such as: “3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?” (9236-1), “Three-dimensional SEM metrology at 10nm” (9236-16), “Assessing the viability of multi-column electron-beam wafer inspection for sub-20nm defects” (9236-14), and “Photomask linewidth comparison by PTB and NIST” (9236-15). In addition, there were a number of general, tutorial-like, invited presentations, such as: “Rigorous quantitative elemental micro-analysis by scanning electron microscopy/energy dispersive x-ray spectrometry (SEM/EDS)” (9236-17) and “Does your SEM really tell the truth? Part 3” (9236-4), which discussed some of the basics of measurement and energy dispersive x-ray microanalysis in the scanning microscope. This year, Scanning Microscopies 2014 awarded Dr. David C. Joy, Distinguished Professor of the University of Tennessee and Distinguished Scientist of the Oak Ridge National Laboratory, the 2014 Professor Sir Charles Oatley Memorial Award: “In recognition of his extraordinary contributions to scanning microscopy (electron and ion), including high resolution SEM, low voltage SEM, helium ion microscopy, electron- and ion-beam- specimen interactions, and SEM applications to semiconductor and magnetic materials. His tireless efforts to educate, inform, and inspire his students and colleagues have enormously advanced the field of microscopy.” The Scanning Microscopy 2013 conference was quite successful, but this year the number of papers exceeded those from the previous DSS conference by nearly a factor of two. A diverse offering of papers covering forensics applications, scanning electron microscopy, helium ion microscopy, scanned probe microscopy, scanned optical microscopy and particle beam microscopy, and electron beam interaction modeling were presented. The “Microscopy for STEM Educators” workshop, initially introduced at DSS 2012, continued in 2014. The session consisted of presentations on the successful implementation of microscopy in the classroom. In a follow-up session, teachers were able to use a table-top scanning electron microscope and atomic force microscope to examine material they had brought with them. The “Microscopy for STEM Educators” workshop provided the opportunity for an introduction to analytical techniques traditionally only available in the research laboratory, and to see unprecedented images of everyday materials, to expand teachers’ understanding of what is possible in the laboratory and classroom. The workshop was broken into a series of presentations and a laboratory session. The presentations discussed the successful applications of advanced scientific instrumentation to engage the learners and promote next-generation science standards inquiry. Following the “Microscopy for STEM Educators” workshop, teachers had the opportunity to visit the Exhibit Hall, where they were encouraged to ask questions of the manufacturers and take advantage of the handouts. Michael T. Postek Dale E. Newbury S. Frank Platek Tim K. Maugel |
