Paper
27 February 2015 Fabrication error tolerant SOI WDM device using bidirectional angled multimode interferometers
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Proceedings Volume 9367, Silicon Photonics X; 936704 (2015) https://doi.org/10.1117/12.2076824
Event: SPIE OPTO, 2015, San Francisco, California, United States
Abstract
We have demonstrated a bidirectional wavelength division (de)multiplexer (WDM) on the silicon-on-insulator platform. An excellent match of the peak transmission wavelength of each channel between the two AMMIs was achieved. This type of device is ideal for integrated optical transceivers where the transmission wavelengths are required to match with the receiving wavelengths. The device also benefits from simple fabrication (as only a single lithography and etching step is required), improved convenience for the transceiver layout design, a reduction in tuning power and circuitry, and efficient use of layout space.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Graham T. Reed, Youfang Hu, David J. Thomson, Ali Z. Khokhar, Stevan Stanković, Colin J. Mitchell, Frederic Y. Gardes, and Goran Z. Mashanovich "Fabrication error tolerant SOI WDM device using bidirectional angled multimode interferometers", Proc. SPIE 9367, Silicon Photonics X, 936704 (27 February 2015); https://doi.org/10.1117/12.2076824
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KEYWORDS
Medium wave

Waveguides

Wavelength division multiplexing

Transceivers

Brain-machine interfaces

Silicon

Semiconducting wafers

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