Paper
27 February 2015 Cross-sectional TEM (XTEM) analysis for vertically coupled quaternary In0.21Al0.21Ga0.58As capped InAs/GaAs quantum dot infrared photodetectors
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Abstract
This paper presents a detailed morphological analysis of vertically strain-coupled InAs quantum dots with a fixed quaternary capping (In0.21Al0.21Ga0.58As) of 3 nm and a GaAs barrier ranging in thicknesses from 9 to 18 nm. The coupled heterostructures were studied using cross-sectional transmission electron microscopy and compared with uncoupled heterostructures with 2-nm quaternary capping and 50-nm GaAs capping thickness. Power-dependent photoluminescence spectra showed that a minimum capping of 9 nm produced a multimodal dot-size distribution. Increasing the capping from 9 to 18 nm reduced the vertical correlation, thus increasing the dot uniformity. Increasing the capping thickness reduced the coupling and increased the dot size. At a maximum capping (18nm) coupled quantum dots exhibit a bimodal dot-size distribution compared to the mono-modal distribution of the uncoupled quantum dots. The coupled samples demonstrated superior optical properties to uncoupled samples.
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Binita Tongbram, Hemant Ghadi, Sourav Adhikary, Arjun Mandal, and Subhananda Chakrabarti "Cross-sectional TEM (XTEM) analysis for vertically coupled quaternary In0.21Al0.21Ga0.58As capped InAs/GaAs quantum dot infrared photodetectors", Proc. SPIE 9373, Quantum Dots and Nanostructures: Synthesis, Characterization, and Modeling XII, 93730S (27 February 2015); https://doi.org/10.1117/12.2074835
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KEYWORDS
Gallium arsenide

Transmission electron microscopy

Quantum dots

Heterojunctions

Indium arsenide

Infrared photography

Infrared radiation

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