Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement

Takahiro Kozawa; Shinya Fujii; Julius Joseph Santillan; Toshiro Itani

doi:10.1117/12.2085619

13 March 2015 Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement

Takahiro Kozawa, Shinya Fujii, Julius Joseph Santillan, Toshiro Itani

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 942206 (2015) https://doi.org/10.1117/12.2085619
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The role of photons in lithography is the transfer of information and energy. The resist patterns are fabricated in accordance with the information carried by photons. The energy is used to induce the chemical reactions required for the solubility change of the resist. In this study, the relationship between information and energy carried by photons was investigated. Which of the factors limits the resist performance depends on the relationship between requirement and resist performance. In the design of next generation resist materials, it is important to determine which is insufficient, information or energy.

Citation Download Citation

Takahiro Kozawa, Shinya Fujii, Julius Joseph Santillan, and Toshiro Itani "Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942206 (13 March 2015); https://doi.org/10.1117/12.2085619

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