Understanding of stochastic noise

Seo-Min Kim; Chang-Moon Lim; Mi-Rim Jung; Young-Sik Kim; Won-Taik Kwon; Chang-Nam Ahn; Kyu-Tae Sun; Anita Fumar-Pici; Alek C. Chen

doi:10.1117/12.2087559

7 April 2015 Understanding of stochastic noise

Seo-Min Kim, Chang-Moon Lim, Mi-Rim Jung, Young-Sik Kim, Won-Taik Kwon, Chang-Nam Ahn, Kyu-Tae Sun, Anita Fumar-Pici, Alek C. Chen

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94220M (2015) https://doi.org/10.1117/12.2087559
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Stochastic noise has strong impact on local variability such as LWR (Line Width Roughness), LCDU (Local Critical Dimension Uniformity) and LPE (Local Placement Error), and it is basically originated from the particle nature of photon. Statistical uncertainties of particles, same as the stochastic noises, can be analytically calculated by considering aerial image as a probability density function of photons. Contact-hole is the best pattern for counting its photon, so LCDU of contact-hole array is estimated and compared with experimental results. Among several possible statistical events from mask to resist pattern, three independent events of aerial image formation, photon absorption in resist, and chemical reaction including acid generation are considered to predict stochastic noise for both EUV (Extreme Ultra Violet) and ArF immersion lithography.

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Seo-Min Kim, Chang-Moon Lim, Mi-Rim Jung, Young-Sik Kim, Won-Taik Kwon, Chang-Nam Ahn, Kyu-Tae Sun, Anita Fumar-Pici, and Alek C. Chen "Understanding of stochastic noise", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220M (7 April 2015); https://doi.org/10.1117/12.2087559

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