Improved scatterometry time-to-solution using virtual reference

Alok Vaid; Givantha Iddawela; Jamie Tsai; Gilad Wainreb; Paul Isbester; Byung Cheol (Charles) Kang; Michael Klots; Yinon Katz; Cornel Bozdog; Matt Sendelbach

doi:10.1117/12.2087232

19 March 2015 Improved scatterometry time-to-solution using virtual reference

Alok Vaid, Givantha Iddawela, Jamie Tsai, Gilad Wainreb, Paul Isbester, Byung Cheol (Charles) Kang, Michael Klots, Yinon Katz, Cornel Bozdog, Matt Sendelbach

Author Affiliations +

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94240X (2015) https://doi.org/10.1117/12.2087232
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Advanced nodes require precise detection and control of intricate profile details – scatterometry is tool of choice for such requirements. Scatterometry is a model-based technique, and needs extensive reference metrology for qualification. Such reference measurements are costly, time-consuming and often destructive causing delays in deployment. With increasing number of scatterometry steps in flow, and the requirement to collect more reference data points to statistically qualify shrinking metrology specifications, the cost and time for reference metrology is exponentially increasing. This work is aimed to significantly reduce this need. We developed a novel methodology whereby scatterometry spectral information itself is used to predict “virtual” reference data. We qualify this methodology on several key applications from 20nm and 14nm node. We find that performance of solution developed using proposed methodology is indeed similar to performance of solution obtained using real reference data, thereby significantly reducing the lead time to develop scatterometry solutions.

Citation Download Citation

Alok Vaid, Givantha Iddawela, Jamie Tsai, Gilad Wainreb, Paul Isbester, Byung Cheol (Charles) Kang, Michael Klots, Yinon Katz, Cornel Bozdog, and Matt Sendelbach "Improved scatterometry time-to-solution using virtual reference", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240X (19 March 2015); https://doi.org/10.1117/12.2087232

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