Paper
21 September 1988 High Reliability Planar InGaAs/InP Photodiodes Made With High Yield by Atmospheric Pressure MOVPE
M. J. Robertson, C. P. Skrimshire, S. Ritchie, S. K. Sargood, A. W. Nelson, R. H. Walling, L. Davis, R. R. Sutherland
Author Affiliations +
Proceedings Volume 0949, Fibre Optics '88; (1988) https://doi.org/10.1117/12.947520
Event: Sira/Fibre Optics '88, 1988, London, United Kingdom
Abstract
A high-yield process for making planar InGaAs/InP photodiodes based on metal-organic vapour phase epitaxy (MOVPE) growth at atmospheric pressure has been developed. The process results in very good uniformity and yield and gives high-performance devices of excellent reliability, with a random failure rate of less than 0.3 FITs at 20°C. This reliability performance is easily able to meet the stringent requirements for detectors in submarine systems.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. J. Robertson, C. P. Skrimshire, S. Ritchie, S. K. Sargood, A. W. Nelson, R. H. Walling, L. Davis, and R. R. Sutherland "High Reliability Planar InGaAs/InP Photodiodes Made With High Yield by Atmospheric Pressure MOVPE", Proc. SPIE 0949, Fibre Optics '88, (21 September 1988); https://doi.org/10.1117/12.947520
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KEYWORDS
Reliability

Indium gallium arsenide

Receivers

Photodiodes

Failure analysis

Semiconducting wafers

Fiber optics

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