Presentation
5 October 2015 Perfect light trapping in mid-IR using patterned ZnO structures (Presentation Recording)
Shivashankar R. Vangala, Nima Nader, Justin W. Cleary, Junpeng Guo, Kevin D. Leedy, Joshua R. Hendrickson
Author Affiliations +
Abstract
Plasmonic assisted mid-IR light trapping using 1D grating structures patterned in Ga-ZnO is demonstrated. FDTD simulations of these structures with proper grating period and depth show the light trapping into a resonant mode resulting in a close to 100% reflection dip in the 4-8 µm wavelength regime. The 1D grating structures of different periods are fabricated using standard photolithography followed by etching. The resonant reflection dips in the experimentally measured spectra well agree with the FDTD simulation, exhibiting light trapping in the mid-IR as predicted.
Conference Presentation
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shivashankar R. Vangala, Nima Nader, Justin W. Cleary, Junpeng Guo, Kevin D. Leedy, and Joshua R. Hendrickson "Perfect light trapping in mid-IR using patterned ZnO structures (Presentation Recording)", Proc. SPIE 9547, Plasmonics: Metallic Nanostructures and Their Optical Properties XIII, 95471N (5 October 2015); https://doi.org/10.1117/12.2189072
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KEYWORDS
Mid-IR

Finite-difference time-domain method

Zinc oxide

Plasmonics

Etching

Optical lithography

Nanolithography

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