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The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), 'Title of Paper,” in 31st European Mask and Lithography Conference, edited by Uwe F.W. Behringer, Jo Finders, Proceedings of SPIE Vol. 9661 (SPIE, Bellingham, WA, 2015) Article CID Number. ISSN: 0277-786X ISBN: 9781628418798 Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2015, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/15/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library.
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The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages. AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Alagna, Paolo, 05 Assmann, Heiko, 0J, 0L Baghdasaryan, Tigran, 0V Baselmans, Jan, 05 Baselt, Tobias, 0J Bottiglieri, Gerardo, 0S Bunday, Benjamin D., 0O Chojnowski, N., 0P Colsters, P., 0B Conley, Will, 05 Cuypers, Dieter, 0V Dankelmann, M., 0L Davydova, Natalia, 09, 0A, 0B, de Bruin, Diederik, 0F de Kruif, Robert, 09, 0B De Smet, Herbert, 0V De Smet, Jelle, 0V de Winter, L., 0A, 0B Decaunes, J., 0P Dellemann, Gregor, 0O Dicker, Gerald, 0F Diez, Steffen, 04 Dillen, Harm, 0N Dong, Feng, 0K Eberle, Anna Lena, 0O Farys, V., 06, 0Q Fenouillet-Beranger, C., 06 Finders, J., 0A Fliervoet, Timon, 09 Fujii, Nobuaki, xvii Garbowski, Tomasz, 0O Garetto, Anthony, 0M Gatefait, M., 0P Greiner, Andreas, 0J Haase, Anton, 0W Hageman, J., 0B Hansson, G., 03 Hara, Daisuke, xvii Hartmann, Peter, 0J Hasan, T., 0R Hayano, Katsuya, xvii Hendrickx, Eric, 09 Hoefnagels, R., 0B Hollink, T., 0B Houser, David C., 0K Hsieh, Simon, 05 Imai, Hidemichi, xvii Jablonski, Michal, 0V Jackson, Allyn, 0Y Jehle, Achim, 04 Jenkins, Peter, 0F Jindal, Vibhu, 0O Jonckheere, R., 0B Joshi, Pankaj, 0V Kabardiadi, Alexander, 0J Kaiser, Winfried, 0T Kanno, Koichi, xvii Katakamsetty, Ushasree, 0E Kemen, Thomas, 0O Kneer, Bernhard, 0T Kocsis, Z., 0P Kottumakulal, R., 0B Krause, A., 0L Kuncha, Rakesh Kumar, 0E Kuribara, Masayuki, xvii Lam, A., 0P Landie, G., 0Q Last, T., 0A Laubis, Christian, 0W Le-Gratiet, B., 0P, 0R Liebregts, W., 0B Mailfert, Julien, 05 Malloy, Matt, 0O Matsumoto, Jun, xvii Matsushita, Shohei, xvii Maurer, R., 0L McNamara, J., 0B Migura, Sascha, 0T Mikolajczak, M., 0P Missinne, Jeroen, 0V Miyashita, Hiroyuki, xvii Miyazaki, Junji, 09 Monget, C., 0P Morin, V., 0P Mukhtar, Maseeh, 0O Murakawa, Tsutomu, xvii Nakamura, Takayuki, xvii Narayana Samy, Aravind, 0E Neumann, Jens Timo, 09, 0S, 0T Newcomb, R., 0L Oorschot, Dorothe, 0G Ostrovsky, A., 0P Pang, Linyong, xvii Pellens, R., 0B Perera, Chami N., 0K Perera, Rupert C. C., 0K Peters, Jan Hendrik, 0O Peterson, Brennan, 0F Philipsen, Vicky, 09, 0G Prentice, C., 0R Psara, Eleni, 0G Quoi, Kathy, 0O Rademacher, Thomas, 0M Rechtsteiner, Greg, 05 Ricken, K., 0B Roesch, Matthias, 0S Sandstrom, T., 03 Schellekens, Twan, 0N Schiffelers, G., 0B Schneider, L., 06 Scholze, Frank, 0W Schulz, Kristian, 0M Serret, E., 06 Shang, Xiaobing, 0V Shida, Soichi, xvii Simiz, J.-G., 0R Sluijk, Boudewijn, 0F Smith, I., 0P Soltwisch, Victor, 0W Specht, M., 0L Staals, F., 0R Sundelin, E., 03 Svensson, A., 03 Taudt, Christopher, 0J Teigell Beneitez, Nuria, 0V Tel, W. T., 0R Thiel, Brad, 0O Thienpont, Hugo, 0V Timoshkov, Vadim, 05 Tishchenko, A., 0R Tritchkov, A., 0Q Usry, W., 0L Vaenkatesan, Vidya, 0B, 0N van Dijk, A., 0B van Dijk, Joep, 0B, 0N van Ingen Schenau, Koen, 0S Van Look, Lieve, 09 van Oosten, Anton, 09 van Schoot, Jan, 09, 0S, 0T van Setten, Eelco, 0B, 0G Verma, Piyush, 0D Vervaeke, Michael, 0V Villaret, A., 0Q Wahlsten, M., 03 Wang, Jingyu, 0D Wei, Alexander, 0D Wilkinson, William, 0D Wittebrood, Friso, 09, 0G Wöltgens, Pieter, 0F Wong, Patrick, 05 Word, J., 0Q Wurm, Stefan, 0O Yesilada, E., 0Q Yoshikawa, Shingo, xvii Zeggaoui, N., 0Q Zeidler, Dirk, 0O Zurita, Omar, 05 Conference Committee Conference Chairs Conference Co-chairs Program Chairs
Other Members
Session Chairs
ForewordOn behalf of VDE/VDI-GMM, the sponsors, and the organizing committee, we would like to welcome you to the proceedings from the 31st European Mask and Lithography Conference, EMLC2015, at the Pullman Hotel in Eindhoven, Netherlands. The conference has annually brought together scientists, researchers, engineers, and technologists from research institutes and companies from around the world to present innovations at the forefront of mask lithography and mask technology. The two-day conference was dedicated to the science, technology, engineering, and application of mask and lithography technologies and associated processes—giving an overview of the present status of mask and lithography technologies, while also providing future strategies where mask producers and users have the opportunity to become acquainted with new developments and results. This year's sessions included: Extension of Immersion Lithography, EUV Lithography, High NA EUV Lithography, EUV Mask Technology, Toward 7nm Technology, Mask Preparation and OPC, Mask Metrology, Mask Writing, and DSA. Rob van Gijzel, mayor of the city of Eindhoven, was the welcome speaker. Lucas van Grinsven, Head of Communication from ASML, was also a welcome speaker. His presentation was titled, “From Shed to Global Leader, ASML to the Brainport of the Netherlands.” Our first keynote speaker was Hans Meiling from ASML, who explained his statement: “EUV lithography into high volume manufacturing: “WHEN”, not “IF.” Our second keynote speaker was Greg McIntyre from IMEC. His talk was titled, “Scaling trends and options: plenty of reason to be hopeful.” On Monday morning, Ingo Bork from Mentor Graphics Corporation presented the Best Paper from PMJ 2015 and the Best Poster from BACUS 2014. On Monday late afternoon a poster session took place. This year some posters were organized by ASML, the co-partner of the EMLC2015. These selected posters were part of the ASML internal Technology Day on Wednesday, June 24. Technical ExhibitionParallel to the conference presentations, a technical exhibition took place on Monday and Tuesday where companies (mask suppliers, material suppliers, and equipment suppliers) exhibited their companies and products. To foster the exchange between conference attendees and exhibitors, the exhibition area was also the place for all coffee and lunch breaks. Uwe F.W. Behringer EMLC2015 Conference Chair |
