Titanium oxide electron-selective layers for contact passivation of thin-film crystalline silicon solar cells

Yi Liu; Yusi Chen; David T. LaFehr; Yen Su; Yijie Huo; Yangsen Kang; Huiyang Deng; Jieyang Jia; Li Zhao; Mengyang Yuan; Zheng Lyu; Daniel DeWitt; Max A. Vilgalys; Kai Zang; Xiaochi Chen; Ching-Ying Lu; Theodore I. Kamins; James S. Harris

doi:10.1117/12.2213540

27 February 2016 Titanium oxide electron-selective layers for contact passivation of thin-film crystalline silicon solar cells

Yi Liu, Yusi Chen, David T. LaFehr, Yen Su, Yijie Huo, Yangsen Kang, Huiyang Deng, Jieyang Jia, Li Zhao, Mengyang Yuan, Zheng Lyu, Daniel DeWitt, Max A. Vilgalys, Kai Zang, Xiaochi Chen, Ching-Ying Lu, Theodore I. Kamins, James S. Harris

Author Affiliations +

Proceedings Volume 9749, Oxide-based Materials and Devices VII; 97491J (2016) https://doi.org/10.1117/12.2213540
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

In crystalline silicon (c-Si) solar cells, carrier selective contacts are among the remaining issues to be addressed in order to reach the theoretical efficiency limit. Especially in ultra-thin-film c-Si solar cells with small volumes and higher carrier concentrations, contact recombination is more critical to the overall performance. In this paper, the advantages of using TiO_X as electron-selective layers for contact passivation in c-Si solar cells are analyzed. We characterize the metal/TiO_X/n-Si electron-selective contact with the contact recombination factor J_0c and the contact resistivity ρc for the first time. Experimental results show that both J_0c and ρc decrease after the insertion of TiO_X. In addition, the effect of post-deposition rapid-thermal-annealing (RTA) at different temperatures is also evaluated. The best J_0c of 5.5 pA/cm² and the lowest ρc of 13.6 mΩ·cm² are achieved after the RTA process. This work reveals the potential of TiO_X as an electron-selective layer for contact passivation to enable high-efficiency ultra-thin c-Si solar cells with a low cost.

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Yi Liu, Yusi Chen, David T. LaFehr, Yen Su, Yijie Huo, Yangsen Kang, Huiyang Deng, Jieyang Jia, Li Zhao, Mengyang Yuan, Zheng Lyu, Daniel DeWitt, Max A. Vilgalys, Kai Zang, Xiaochi Chen, Ching-Ying Lu, Theodore I. Kamins, and James S. Harris "Titanium oxide electron-selective layers for contact passivation of thin-film crystalline silicon solar cells", Proc. SPIE 9749, Oxide-based Materials and Devices VII, 97491J (27 February 2016); https://doi.org/10.1117/12.2213540

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